System for and Method of Monitoring Flow Through Mass Flow Controllers in Real Time

ABSTRACT

A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of U.S. patent applicationSer. No. 13/354,988 filed Jan. 20, 2012 in the name of Junhua Ding andassigned to the present assignee.

BACKGROUND

1. Field

This disclosure relates generally to mass flow controllers (MFCs), andmore particularly to a system for and method of monitoring flow throughMFCs in real time. As used herein the term “gas” includes the term“vapor(s)” should the two terms be considered different.

2. Overview

Mass flow controllers (MFCs) are devices for measuring and controllingthe flow of gases. They are usually used to control the flow of gasesduring a semiconductor manufacturing process wherein the flow of gasesinto a semiconductor tool, such as a vacuum chamber, must be carefullycontrolled in order to produce high yield semiconductor products. MFCsare usually designed and calibrated to control specific types of gas atparticular ranges of flow rates. The devices control the rate of flowbased on a given setpoint, usually predetermined by the user or anexternal device such as the semiconductor tool itself. MFCs can beeither analog or digital. They are typically designed to be used withpressure ranges of the inlet gases, with low pressure and high pressureMFCs being available. All MFCs have an inlet port, and outlet ports, amass flow meter including a mass flow sensor and a proportional controlvalve. A system controller is used as a part of a feedback controlsystem that provides a control signal to the control valve as a functionof a comparison of the flow rate as determined by the setpoint with themeasured flow rate as sensed by the mass flow sensor. The feedbackcontrol system thus operates the valve so that the measured flow ismaintained at the flow rate as determined by the setpoint.

Such control systems assume that the MFC remains in calibration withincertain tolerances. In order test whether an MFC is within thetolerances of calibration, the MFC is typically tested off line withsuch devices as mass flow verifiers. The latter are used to test theflow rates. While off line testing is very accurate, there is always aproblem that a MFC can become out of calibration during the running of aprocess (in real time), and not be detected until the process iscompleted. Often this can result in lower yields of semiconductorproduct, and even a complete failure resulting in the loss of the entireproduct yield. This can be expensive, and is clearly undesirable. Whatis needed is a device and method for continually testing the calibrationsettings of a MFC in real time while processes are being run.

DESCRIPTION OF RELATED ART

Reference is made to Japanese Published Application 2004-246826A2004.9.2and U.S. Pub. App. No. 2006/0278276.

SUMMARY

In accordance with one embodiment, a mass flow controller is providedfor controlling the flow of gas from a source to a target. The mass flowcontroller comprises: first and second flow meters, and upstream anddownstream proportional control valves. The first flow meter isconstructed and arranged to measure the flow rate of the mass of a gasthrough the mass flow controller as a function of thermal sensing massflow. The second flow meter includes a pressure sensor and a structuredefining a predefined volume for receiving gas flowing through the massflow controller. The second flow meter is constructed and arranged tomeasure flow rate of the mass of the gas through the mass flowcontroller as a function of measured rate of decay of the gas pressurewhen allowed to flow from a predefined volume. The upstream proportionalcontrol valve is constructed and arranged to selectively control therate of flow of gas into the mass flow controller. The downstreamproportional control valve is constructed and arranged so as to controlthe flow rate of the mass of the gas from the mass flow controller inresponse to a control signal generated as a function of a set point andthe flow rate as measured by one of the flow meters. A systemprocessor/controller constructed and arranged to generate the controlsignal, and to provide an indication when a difference between the flowrate of mass the gas as measured by the first flow meter and the flowrate of the mass of the gas as measured by the second flow meter exceedsa threshold. The pressure sensor, upstream flow proportional controlvalve and system processor/controller are further constructed andarranged so as to form a closed-loop pressure controller configured toregulate the pressure inside the predefined volume.

In one embodiment the closed-loop pressure controller is furtherconstructed and arranged so that the upstream proportional control valvecan be adjusted so as to let the inside pressure of the predefinedvolume rise to the upstream pressure of inlet gas sufficiently slow soas to avoid in-rush gas.

In one embodiment the closed-loop pressure controller is furtherconstructed and arranged so that if there is an upstream pressuredisturbance during flow control when the mass flow controller iscontrolling the flow of gas from a source to a target, the closed-looppressure controller will automatically adjust the openness of theupstream proportional control valve so as to regulate the pressurewithin the predetermined volume such that the inlet pressure disturbanceeffect on the output flow control of the mass flow controller isminimized and the pressure insensitivity performance of the flow controlof mass flow controller is improved.

In one embodiment the closed-loop pressure controller is constructed andarranged so that if there is an upstream pressure disturbance duringflow control when the mass flow controller is controlling the flow ofgas from a source to a target, the closed-loop pressure controller willautomatically adjust the openness of the upstream proportional controlvalve so as to regulate the pressure within the predetermined volumesuch that the inlet pressure disturbance effect on the output flowcontrol of the mass flow controller is minimized and the pressureinsensitivity performance of the flow control of mass flow controller isimproved.

In one embodiment the structure defining the predefined volume supportsone or more of the first flow meter, the second flow meter, the upstreamproportional control valve and the downstream proportional controlvalve.

In one embodiment the first mass flow meter comprises a thermal massflow meter, and the downstream proportional control valve is positioneddownstream from the thermal mass flow meter.

In one embodiment the second proportional control valve is positionedupstream from the first proportional control valve, the predefinedvolume is positioned between the first proportional control valve andthe second proportional control valve through which gas can flow; andthe mass flow controller further includes a pressure sensor andtemperature sensor for respectively generating a pressure signal and atemperature signal representing the temperature and pressure of gas inthe predefined volume.

In one embodiment the second flow meter includes a pressure sensor, andthe system processor/controller, the pressure sensor and the secondcontrol valve form a closed-loop pressure controller to regulate thepressure inside the predefined volume.

In one embodiment the predefined volume is within the mass flowcontroller between the first and second control valve, and theclosed-loop pressure controller is constructed and arranged so that (1)the second control valve can be controlled so as to slowly let theinside pressure of the MFC rise to the upstream pressure of the inletgas in order to avoid in-rush gas; and (2) if there is an upstreampressure disturbance during the flow control period, the closed-looppressure controller will automatically adjust the openness of the secondcontrol valve so as to regulate the pressure within the predeterminedvolume such that the inlet pressure disturbance effect on the outputflow control of the mass flow controller is minimized, so as to improvethe pressure insensitivity performance of the flow control of mass flowcontroller.

In one embodiment the mass flow controller and the processor/controllerare configured and arranged to operate as follows:

-   -   (a) when the set point at zero the flow control valve is closed,        and the second control valve upstream from the flow control        valve is opened to allow the gas from the source to fill the        predefined volume. Then the second control valve is closed;    -   (b) when a flow set point is changed from zero to a non-zero        value, the second control valve is kept close and the flow        control valve is opened to regulate the flow Qt measured by the        first flow meter to the flow set point;    -   (c) for a predetermined period of time, the mass flow controller        verifies the flow rate based on the rate of decay of the        pressure signal in accordance with the following relationship:

Qv=−V[d(P/T)]/dt

-   -   wherein QV is the verified flow rate as determined by the second        flow meter;    -   V is the predetermined volume;    -   P is the pressure as measured by the pressure signal;    -   T is the temperature as measured by the temperature signal; and    -   d(P/T)/dt is the first derivative of the ratio P/T; i.e., the        rate of change of the ratio P/T. and    -   (d) After the flow verification, the second control valve is        opened to let mass flow controller continue the flow control.

In one embodiment the predetermined period of time is between about 50ms and 1000 ms.

In one embodiment the mass flow controller is further configured tocompare the verified flow rate Qv, with the flow rate measured by thefirst flow meter Qt, and wherein a flow error alarm signal is providedif the deviation between Qt and Qv exceeds the threshold.

In one embodiment the mass flow controller is configured to performself-calibration based on the measured values of Qv and Qt.

In one embodiment the first proportional control valve is controlledallowing gas to flow through the mass flow controller as a function ofthe flow set point flow rate of mass through the mass flow controller solong as the flow set point is non-zero.

In one embodiment following the setting of the flow set point to zero,the mass flow controller is configured to immediately close the secondproportional flow control valve.

In one embodiment the threshold is user set.

In one embodiment the threshold is factory set.

In one embodiment the threshold is set as a function of permissibletolerance in mass flow for the process with which the controller is usedto deliver gas.

In accordance with one embodiment, a pressure insensitive mass flowcontroller is constructed and arrange to control the flow of gas from asource to a target. The mass flow controller comprises a first flowmeter, a first proportional control valve, a systemprocessor/controller, a second flow meter, a second, and an upstreamproportional control valve. The first flow meter is constructed andarranged to provide a mass flow signal as a function of a set point andthe measured flow of gas through the mass flow controller. The firstproportional control valve is constructed and arranged to control theflow of gas through the mass flow controller in response to a valvecontrol signal. The system processor/controller constructed and arrangedto generate the valve control signal as a function of a set point signaland mass flow signal. The second flow meter includes a pressure sensorconstructed and arranged to provide a pressure measurement signalrepresenting the measured pressure of the gas flowing through the massflow controller. The second flow meter is constructed and arranged toprovide a second mass flow signal as a function of the measured pressureof the gas. The second, upstream proportional control valve isconstructed and arranged upstream from the pressure sensor toselectively control the rate of flow of gas into the mass flowcontroller as a function of the second mass flow signal. The pressuresensor, second upstream flow proportional control valve and systemprocessor/controller are further constructed and arranged so as to forma closed-loop pressure controller configured to regulate the pressureflow into the mass flow controller.

In accordance with another embodiment, a mass flow controller isconstructed and arranged to control the flow rate of gas from a sourceto a target. The mass flow controller comprises: a first flow meter, asecond flow meter, an upstream proportional control valve, a downstreamproportional control valve, and a system processor/controller. The firstflow meter is constructed and arranged to measure the flow rate of themass of a gas through the mass flow controller as a function of sensingmass flow. The second flow meter includes a pressure sensor and astructure defining a predefined volume for receiving gas flowing throughthe mass flow controller. The second flow meter is constructed andarranged to measure and verify the flow rate of the mass of the gasthrough the mass flow controller as a function of measured pressure rateof decay of the gas when allowed to flow from the predefined volume. Theupstream proportional control valve constructed and arranged toselectively control the flow rate of gas into the mass flow controller.The downstream proportional control valve is constructed and arranged soas to control the flow rate of the mass of the gas from the mass flowcontroller in response to a control signal generated as a function of aset point and the flow rate as measured by the first flow meter. Thesystem processor/controller is constructed and arranged to generate thecontrol signal and verify the accuracy of the mass flow control of themass flow controller as a function of the measured pressure rate ofdecay of the gas allowed to flow from the predetermined volume. Thestructure defining the predefined volume is a mounting block forsupporting at least the second flow meter and the upstream proportionalcontrol valve.

These, as well as other components, steps, features, objects, benefits,and advantages, will now become clear from a review of the followingdetailed description of illustrative embodiments and the accompanyingdrawings.

BRIEF DESCRIPTION OF DRAWINGS

The drawings disclose illustrative embodiments. They do not set forthall embodiments. Other embodiments may be used in addition or instead.Details which may be apparent or unnecessary may be omitted to savespace or for more effective illustration. Conversely, some embodimentsmay be practiced without all of the details which are disclosed. Whenthe same numeral appears in different drawings, it refers to the same orlike components or steps.

FIG. 1 is a simplified block diagram of a MFC constructed and arrangedto control flow through the MFC and monitor the accuracy of the MFC inreal time;

FIG. 2 is a block diagram of an embodiment of a MFC employing theteachings described here;

FIG. 3 is a block diagram of components for generating a signalindicating when an MFC, such as the ones described in connection withFIGS. 1 and 2 are out of calibration tolerances; and

FIG. 4 is a block diagram of another embodiment of a MFC employing theteachings described herein.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

Illustrative embodiments are now discussed. Other embodiments may beused in addition or instead. Details which may be apparent orunnecessary may be omitted to save space or for a more effectivepresentation. Conversely, some embodiments may be practiced without allof the details which are disclosed.

Referring to FIG. 1, the illustrated, exemplary mass flow controller 10is constructed and arranged to control flow through the MFC and monitorthe accuracy of the MFC in real time. As shown the controller 10includes two flow meters 12 and 14, each independently generating asignal representing the measured rate of flow of gas through the MFC.The outputs of the two flow meters are provided to the system controller16. The controller 16 processes the two signals received from the twoflow meters 12 and 14 and provides a control signal to the proportionalcontrol valve 18 based on the flow measured by one of the flow metersand a set point, and an indication (“alarm”) signal when a determinationis made that the difference in the flow rates as measured by the twometers exceeds a predetermined threshold.

A more detailed exemplary embodiment of a MFC, indicated generally at20, is shown in FIG. 2. The MFC 20 is constructed and arranged so as tocontrol flow through the MFC and monitor the accuracy of the MFC in realtime. As shown gas is received at the input port 32 of block 28including a conduit defining the main flow path 34 through the MFC tothe outlet port 60. The first flow meter 30 is shown as a thermal massflow meter. Thermal mass flow meters typically include a thermal massflow sensor 36. The latter usually includes a bypass element 38 disposedin the bypass of the main flow path 34 of the gas flow through the block28. A U-shaped capillary tube 40 has opposite ends respectivelyconnected to the primary pathway at the upstream and downstream ends ofthe bypass element 38. One or more resistance elements 42 (two being themost common) are used to measure flow through the capillary tube basedon temperature measurements as a function, in the example, of thedifference in resistances of the two resistance elements, which in turnis a function of the difference in the sense temperatures of the fluid,a measure of the mass flow rate. The bypass element 38 is designed toensure that gas flow through the bypass element 38 between the two endsof the capillary tube 40 is laminar. By maintaining laminar flow, themeasured flow rate of gas through the capillary tube will be an accuratepercentage of the flow through the main flow path 34. Thus, the sensedflow rate through the capillary tube 40 will be an accurate measure ofthe flow rate though the MFC 20 and exiting outlet port 60. Datarepresenting the sensed flow rate is communicated to the systemcontroller 16.

The second flow meter 50 is shown as a differential pressure flow meter.For choked flow conditions, the flow meter 50 includes a flow restrictor52 (for example, a critical flow nozzle or orifice), and a temperaturesensor 54 and an upstream pressure sensor 56 arranged to measure therespective temperature and pressure of the gas flowing through the mainflow path 34 upstream from the flow restrictor 52. Data representing thesensed temperature and pressure is transmitted to the system controllerfor use in determining mass flow through the second flow meter 50 as afunction of these sensed measurements. For non-choked flow conditions, asecond or downstream pressure sensor 58 is provided on the downstreamside of the flow restrictor 52. Data representing the sensedtemperature, upstream pressure and downstream pressure is transmitted tothe system controller 16 for determining mass flow through the secondmeter 50 as a function of the sensed measurements. The secondmeasurement provided by the second flow meter 50 (in both the choked andnon-choked embodiments) is independent of the measurement provided bythe first flow meter 30.

Referring to FIG. 3, the system controller 16 processes the outputs ofthe flow meters 70 and 72 so as to provide two flow measurements of thesame flow through the MFC. As shown flow meter 70 is provided to a flowcontrol unit 74, which in turn applies a control signal to theproportional control valve 18. A comparator 76 is provided to comparethe data representing the sensed flow measurements provided by the twometers 70 and 72 to provide an output signal as a function of andrepresenting any difference between the two measurements. This outputsignal is compared to some threshold value (provided by thresholdsetting 80) by a threshold detector 78. Should the output signal ofcomparator 76 exceed the threshold value (wherein the two meters providedifferent flow measurements such that the difference between the twoexceed a predetermined threshold), the threshold detector provides analarm or indicating signal to alert the user that at least one of themeters is inaccurate, and that the MFC should be taken off line andfurther tested. It should be noted that the value of the thresholdsetting at 80 can be provided in anyone of a number of ways includingsetting the value during the initial factory setup of the MFC, or userprogrammed. The threshold value can be set as a function of permissibletolerances in mass flow for the particular process with which thecontroller is used to deliver gas. Thus, some processes may permitgreater tolerances in the rate of flow than others.

While the first and second flow meters have been respectively describedas a thermal mass flow meter and a differential pressure flow meter inFIG. 2, they can be other types of flow meters as well, such as coriolisflow meter, magnetic flow meter or ultrasonic flow meter, depending onthe application for which the MFC 20 is intended. Another example isshown in FIG. 4, and discussed in more detail below. Although it ispreferred that the type of the first flow meter is different from thatof the second flow meter, the two flow meters can be same type. Forexample, both flow meters can be either thermal mass flow meters ordifferential pressure flow meters. Further, although the first flowmeter 30 is located upstream to the control valve 18 and the second flowmeter is located downstream to the control valve 18, the locations ofthese two flow meters can be anywhere along the main flow path 34 of theMFC. For example, both flow meters can be upstream or downstream to thecontrol valve 18.

As shown in FIG. 3, while the measurement from the first flow meter 70is used in the flow control unit 74 to control the MFC flow output andthe measurement from the second flow meter 72 is used to verify theaccuracy of the MFC in real time, the measurement from the second flowmeter 72 can be used in the flow control unit 74 to control the flowoutput of the MFC 20 and the measurement from the first flow meter 70 beused for flow verification.

Another more detailed exemplary embodiment of a MFC 90 illustrated inFIG. 4, includes system controller and processor 110 and two flow meters100 and 120 that are configured and arranged and operate in a mannerdescribed herein. The embodiment shown in FIG. 4 utilizes a thermal massflow meter for measuring the flow, and a downstream control valve forresponding to the measurements by the thermal mass flow meter so as tocontrol the flow through the MFC 90. In addition, MFC 90 includesintegrated pressure and temperature sensors, a predetermined internalvolume and an integrated upstream control valve (together with thedownstream control valve) to provide flow verification utilizing apressure rate of decaying method.

As shown in FIG. 4, gas is received at the input port 92 of block 94.The latter includes a passageway defining main flow path 96 through theMFC to the outlet port 98. The first flow meter 100 is shown as athermal mass flow meter. As described above, thermal mass flow meterstypically include a thermal mass flow sensor, such as shown at 102. Thelatter usually includes a bypass element 104 disposed in the bypass ofthe main flow path 96 of the gas flow through the block 94. A U-shapedcapillary tube 106 has opposite ends respectively connected to theprimary pathway at the upstream and downstream ends of the bypasselement 104. One or more resistance elements (not shown) (two being themost common) are used to measure flow through the capillary tube basedon temperature measurements. In this example, temperature can bemeasured as a function of the difference in resistances of the tworesistance elements, which in turn is a function of the difference inthe sense temperatures of the fluid. The measured temperature differenceis in turn a measure of the mass flow rate. The bypass element 104 isdesigned to ensure that gas flow through the bypass element 104 betweenthe two ends of the capillary tube 106 is laminar. By maintaininglaminar flow, the measured flow rate of gas through the capillary tube106 will be an accurate percentage of the flow through the main flowpath 96. Thus, the sensed flow rate through the capillary tube 106 willbe an accurate measure of the flow rate though the MFC 90 and exitingoutlet port 98. Data representing the sensed flow rate is communicatedto the system controller 110. The flow rate is controlled with thedownstream control valve 112. More specifically, a signal is provided tothe system controller 110 by the flow meter 100 as a function of themeasured flow rate sensed by the thermal mass flow sensor 102. Thesystem controller 110 also receives a signal representative of a setpoint representing the desired flow. The set point is a function of theprocess being run. The two signals are compared and a feedback signal isprovided to downstream control valve 112. The controller is configuredand arranged to adjust the control valve as needed to insure the actualflow rate equals the set point as close as possible.

In order to verify that the thermal mass flow meter 100 and controlvalve 112 are accurately controlling the flow of gas through the massflow controller 90, the mass flow controller 90 also includes a secondflow meter 120 that is configured and arranged to verify the flow ratethrough the mass flow controller (as measured by the thermal mass flowmeter) utilizing a pressure rate of decaying method. The second flowmeter 120 includes predetermined volume 122 for receiving gas flowingthough the mass flow controller. In the illustrated embodiment thepredetermined volume 122 is formed and defined by a cavity in astructure in the form of the block 94. Forming the volume in block 94eliminates the need for a separate vessel container defining the volume122 so as to reduce the complexity and cost of the MFC. While all of thecomponents are shown secured to the block 94, not all of the componentsneed be so mounted. For example, only the second flow meter 120 andupstream proportional control valve 128 could be mounted on the block94, with the other components separately mounted on other structure. Thesecond flow meter also includes pressure sensor 124 and a temperaturesensor 126 respectively providing to the system controller 110 signalsrepresenting the pressure and temperature of gas within the volume 122.The second flow meter also includes the use of upstream control valve128, as well as downstream control valve 112, so that the two flowmeters share the same downstream valve. The second control valve 128 canbe either an isolation valve or a proportional control valve. If thesecond control valve 128 is a proportional control valve, the pressuresensor 124 and the second control valve 128 along with the systemcontroller or processor 110 can form a closed-loop pressure controllersuch that (1) the pressure rising inside the MFC's predefined volume 122is well under control when the flow verification is done, and secondcontrol valve 128 is opened to let gas into the MFC, i.e. controllingthe second control valve so as to slowly let the inside pressure of theMFC rise to the upstream pressure of the inlet gas in order to avoidin-rush gas; and (2) if there is an upstream inlet pressure disturbanceduring the flow control period (any nonzero flow set point), thispressure controller will automatically adjust the openness of the secondcontrol valve 128 so as to regulate the inside pressure between the twocontrol valves 128 and 112 such that the inlet pressure disturbanceeffect on the MFC output flow control is minimized. This improves thepressure insensitivity performance of the flow control of MFC 90.

The controller 110 is configured and arranged to operate as follows:

-   -   (a) When the set point is at zero the downstream valve is        closed, and the upstream valve is open such that the volume        between the control valve 128 and the control valve 112 is        allowed to fill with gas from the source that is coupled to the        input port 92. When the inside pressure (measured by the        pressure sensor 124) is stabilized, the upstream control valve        128 is closed.    -   (b) When a flow set point is changed from zero to a non-zero        value, the upstream control valve 128 is kept close and the        downstream flow control valve 112 is opened to regulate the flow        Qt based on the measurement of first flow meter 100 to the flow        set point provided to the controller 110.    -   (c) For a predetermined period of time, the mass flow controller        verifies the flow rate based on the rate of decay of the        pressure signal (as the pressure drops within the volume 122) in        accordance with the following relationship:

Q _(v) =−V[d(P/T)]/dt

-   -   wherein Q_(v) is the verified flow rate as determined by the        second flow meter;    -   V is the predetermined volume of volume 122;    -   P is the pressure as measured by pressure sensor 124 and        represented by the signal provided by the sensor 124 to the        controller 110;    -   T is the temperature as measured by temperature sensor 126 and        represented by the signal provided by the temperature sensor 126        to the controller 110; and    -   d(P/T)/dt is the first derivative of the ratio P/T, i.e. the        rate of change of the ratio P/T.

In one embodiment the predetermined period of time for measuring theflow with the flow meter 120 is between about 50 ms and about 1000 ms,although this can vary depending on the specific application to whichthe mass flow controller is used.

-   -   (d) Following the verification measurement, the flow rate        verification value Qv is obtained by the controller 110 and        stored in memory (not shown). The upstream control valve 128 can        then be opened in order to let mass flow controller 90 continue        the flow control utilizing the first flow meter 100.

The system controller 110, the pressure sensor 124 and the upstreamcontrol valve 128 can form a closed-loop pressure controller to regulatethe pressure inside the predefined volume 122. The closed-loop pressurecontroller is constructed and arranged so that (1) the second controlvalve can be controlled so as to slowly let the inside pressure of theMFC rise to the upstream pressure of the inlet gas in order to avoidin-rush gas; and (2) if there is an upstream pressure disturbance duringthe flow control period, the closed-loop pressure controller willautomatically adjust the openness of the second control valve so as toregulate the pressure within the predetermined volume such that theinlet pressure disturbance effect on the output flow control of the massflow controller is minimized, so as to improve the pressureinsensitivity performance of the flow control of mass flow controller.

The system controller 110 can be configured in a similar manner to thatof the arrangement shown in FIG. 3 so as to use the measurements of flowfrom the second flow meter to verify the accuracy of the measurementsprovided by the first flow meter. Thus, in the illustrated embodiment,the mass flow controller 90 is further configured to compare theverified flow rate Q_(v) of the second flow meter (120) with the flowrate measured by the first flow meter (100) Q_(t), and a flow erroralarm signal is provided if the deviation between Q_(t) and Q_(v)exceeds a predetermined threshold.

In one embodiment, the mass flow controller 90 is configured to performself-calibration based on the measured values of Q_(v) and Q_(t). Thecontrol valve 112 is controlled allowing gas to flow through the massflow controller 90 as a function of the flow set point through the massflow controller so long as the flow set point is non-zero. Following thesetting of the flow set point to zero, the mass flow controller isconfigured to immediately close the downstream flow control valve 112.

The components, steps, features, objects, benefits and advantages whichhave been discussed are merely illustrative. None of them, nor thediscussions relating to them, are intended to limit the scope ofprotection in any way. Numerous other embodiments are also contemplated.These include embodiments which have fewer, additional, and/or differentcomponents, steps, features, objects, benefits and advantages. Thesealso include embodiments in which the components and/or steps arearranged and/or ordered differently.

Unless otherwise stated, all measurements, values, ratings, positions,magnitudes, sizes, and other specifications which are set forth in thisspecification, including in the claims which follow, are approximate,not exact. They are intended to have a reasonable range which isconsistent with the functions to which they relate and with what iscustomary in the art to which they pertain.

All articles, patents, patent applications, and other publications whichhave been cited in this disclosure are hereby incorporated herein byreference.

The phrase “means for” when used in a claim is intended to and should beinterpreted to embrace the corresponding structures and materials whichhave been described and their equivalents. Similarly, the phrase “stepfor” when used in a claim is intended to and should be interpreted toembrace the corresponding acts which have been described and theirequivalents. The absence of these phrases in a claim mean that the claimis not intended to and should not be interpreted to be limited to any ofthe corresponding structures, materials, or acts or to theirequivalents.

Nothing which has been stated or illustrated is intended or should beinterpreted to cause a dedication of any component, step, feature,object, benefit, advantage, or equivalent to the public, regardless ofwhether it is recited in the claims.

The scope of protection is limited solely by the claims which nowfollow. That scope is intended and should be interpreted to be as broadas is consistent with the ordinary meaning of the language which is usedin the claims when interpreted in light of this specification and theprosecution history which follows and to encompass all structural andfunctional equivalents.

What is claimed is:
 1. A mass flow controller for controlling the flowof gas from a source to a target, the mass flow controller comprising: afirst flow meter constructed and arranged to measure the flow rate ofthe mass of a gas through the mass flow controller as a function ofthermal sensing mass flow; a second flow meter including a pressuresensor and a structure defining a predefined volume for receiving gasflowing through the mass flow controller, the second flow meter beingconstructed and arranged to measure flow rate of the mass of the gasthrough the mass flow controller as a function of measured rate of decayof the pressure of the gas when allowed to flow from a predefinedvolume; an upstream proportional control valve constructed and arrangedto selectively control the rate of flow of gas into the mass flowcontroller; a downstream proportional control valve constructed andarranged so as to control the flow rate of the mass of the gas from themass flow controller in response to a control signal generated as afunction of a set point and the flow rate as measured by one of the flowmeters; and a system processor/controller constructed and arranged togenerate the control signal, and to provide an indication when adifference between the flow rate of mass the gas as measured by thefirst flow meter and the flow rate of the mass of the gas as measured bythe second flow meter exceeds a threshold; wherein the pressure sensor,upstream flow proportional control valve and system processor/controllerare further constructed and arranged so as to form a closed-looppressure controller configured to regulate the pressure inside thepredefined volume.
 2. The mass flow controller according to claim 1,wherein the closed-loop pressure controller is further constructed andarranged so that the upstream proportional control valve can be adjustedso as to let the inside pressure of the predefined volume rise to theupstream pressure of inlet gas sufficiently slow so as to avoid in-rushgas.
 3. The mass flow controller according to claim 2, wherein theclosed-loop pressure controller is further constructed and arranged sothat if there is an upstream pressure disturbance during flow controlwhen the mass flow controller is controlling the flow of gas from asource to a target, the closed-loop pressure controller willautomatically adjust the openness of the upstream proportional controlvalve so as to regulate the pressure within the predetermined volumesuch that the inlet pressure disturbance effect on the output flowcontrol of the mass flow controller is minimized and the pressureinsensitivity performance of the flow control of mass flow controller isimproved.
 4. The mass flow controller according to claim 1, wherein theclosed-loop pressure controller is constructed and arranged so that ifthere is an upstream pressure disturbance during flow control when themass flow controller is controlling the flow of gas from a source to atarget, the closed-loop pressure controller will automatically adjustthe openness of the upstream proportional control valve so as toregulate the pressure within the predetermined volume such that theinlet pressure disturbance effect on the output flow control of the massflow controller is minimized and the pressure insensitivity performanceof the flow control of mass flow controller is improved.
 5. A mass flowcontroller according to claim 1, wherein the structure defining thepredefined volume supports one or more of the first flow meter, thesecond flow meter, the upstream proportional control valve and thedownstream proportional control valve.
 6. A mass flow controlleraccording to claim 1, wherein the first mass flow meter comprises athermal mass flow meter, and the downstream proportional control valveis positioned downstream from the thermal mass flow meter.
 7. A massflow controller according to claim 1, wherein the second proportionalcontrol valve is positioned upstream from the first proportional controlvalve, the predefined volume is positioned between the firstproportional control valve and the second proportional control valvethrough which gas can flow; and the mass flow controller furtherincludes a pressure sensor and temperature sensor for respectivelygenerating a pressure signal and a temperature signal representing thetemperature and pressure of gas in the predefined volume.
 8. A mass flowcontroller according to claim 7, wherein the predefined volume is withinthe mass flow controller between the first and second control valve, andthe closed-loop pressure controller is constructed and arranged so that(1) the second control valve can be controlled so as to slowly let theinside pressure of the MFC rise to the upstream pressure of the inletgas in order to avoid in-rush gas; and (2) if there is an upstreampressure disturbance during the flow control period, the closed-looppressure controller will automatically adjust the openness of the secondcontrol valve so as to regulate the pressure within the predeterminedvolume such that the inlet pressure disturbance effect on the outputflow control of the mass flow controller is minimized, so as to improvethe pressure insensitivity performance of the flow control of mass flowcontroller.
 9. A mass flow controller according to claim 1, wherein themass flow controller and the processor/controller are configured andarranged to operate as follows: (a) when the set point at zero the flowcontrol valve is closed, and the second control valve upstream from theflow control valve is opened to allow the gas from the source to fillthe predefined volume. Then the second control valve is closed; (b) whena flow set point is changed from zero to a non-zero value, the secondcontrol valve is kept close and the flow control valve is opened toregulate the flow Q_(t) measured by the first flow meter to the flow setpoint; (c) for a predetermined period of time, the mass flow controllerverifies the flow rate based on the rate of decay of the pressure signalin accordance with the following relationship:Q _(v) =−V[d(P/T)]/dt wherein Q_(v) is the verified flow rate asdetermined by the second flow meter; V is the predetermined volume; P isthe pressure as measured by the pressure signal; T is the temperature asmeasured by the temperature signal; and d(P/T)/dt is the firstderivative of the ratio P/T; i.e., the rate of change of the ratio P/T.and (d) After the flow verification, the second control valve is openedto let mass flow controller continue the flow control.
 10. A mass flowcontroller according to claim 9, wherein the predetermined period oftime is between about 50 ms and 1000 ms.
 11. A mass flow controlleraccording to claim 9, wherein the mass flow controller is furtherconfigured to compare the verified flow rate Q_(v), with the flow ratemeasured by the first flow meter Q_(t), and wherein a flow error alarmsignal is provided if the deviation between Q_(t) and Q_(v) exceeds thethreshold.
 12. A mass flow controller according to claim 11, wherein themass flow controller is configured to perform self-calibration based onthe measured values of Q_(v) and Q_(t).
 13. A mass flow controlleraccording to claim 1, wherein the first proportional control valve iscontrolled allowing gas to flow through the mass flow controller as afunction of the flow set point flow rate of mass through the mass flowcontroller so long as the flow set point is non-zero.
 14. A mass flowcontroller according to claim 1, wherein following the setting of theflow set point to zero, the mass flow controller is configured toimmediately close the second proportional flow control valve.
 15. A massflow controller according to claim 1, wherein the threshold is user set.16. A mass flow controller according to claim 1, wherein the thresholdis factory set.
 17. A mass flow controller according to claim 1, whereinthe threshold is set as a function of permissible tolerance in mass flowfor the process with which the controller is used to deliver gas.
 18. Apressure insensitive mass flow controller for controlling the flow ofgas from a source to a target, the mass flow controller comprising: afirst flow meter constructed and arranged to provide a mass flow signalas a function of a set point and the measured flow of gas through themass flow controller; a first proportional control valve constructed andarranged to control the flow of gas through the mass flow controller inresponse to a valve control signal; a system processor/controllerconstructed and arranged to generate the valve control signal as afunction of a set point signal and mass flow signal; a second flow meterincluding a pressure sensor constructed and arranged to provide apressure measurement signal representing the measured pressure of thegas flowing through the mass flow controller, the second flow meterbeing constructed and arranged to provide a second mass flow signal as afunction of the measured pressure of the gas; a second, upstreamproportional control valve constructed and arranged upstream from thepressure sensor to selectively control the rate of flow of gas into themass flow controller as a function of the second mass flow signal;wherein the pressure sensor, second upstream flow proportional controlvalve and system processor/controller are further constructed andarranged so as to form a closed-loop pressure controller configured toregulate the pressure flow into the mass flow controller.
 19. A massflow controller for controlling the flow rate of gas from a source to atarget, the mass flow controller comprising: a first flow meterconstructed and arranged to measure the flow rate of the mass of a gasthrough the mass flow controller as a function of sensing mass flow; asecond flow meter including a pressure sensor and a structure defining apredefined volume for receiving gas flowing through the mass flowcontroller, the second flow meter being constructed and arranged tomeasure and verify the flow rate of the mass of the gas through the massflow controller as a function of measured pressure rate of decay of thegas when allowed to flow from the predefined volume; an upstreamproportional control valve constructed and arranged to selectivelycontrol the flow rate of gas into the mass flow controller; a downstreamproportional control valve constructed and arranged so as to control theflow rate of the mass of the gas from the mass flow controller inresponse to a control signal generated as a function of a set point andthe flow rate as measured by the first flow meter; and a systemprocessor/controller constructed and arranged to generate the controlsignal and verify the accuracy of the mass flow control of the mass flowcontroller as a function of the measured pressure rate of decay of thegas allowed to flow from the predetermined volume; wherein the structuredefining the predefined volume is a mounting block for supporting atleast the second flow meter and the upstream proportional control valve.